2D self-aligned via patterning strategy with EUV single exposure in 3nm technology

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Authors
Choi, Suhyeong; Lee, Jae Uk; Blanco, Victor; Kim, Ryan Ryoung han; Shin, Youngsoo
Conference
Extreme Ultraviolet (EUV) Lithography VIII
Title
2D self-aligned via patterning strategy with EUV single exposure in 3nm technology
Publication type
Proceedings paper
Embargo date
9999-12-31
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