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Modeling of via resistance for advanced technology nodes

dc.contributor.authorCiofi, Ivan
dc.contributor.authorRoussel, Philippe
dc.contributor.authorSaad, Yves
dc.contributor.authorMoroz, Victor
dc.contributor.authorHu, Jojo
dc.contributor.authorBaert, Rogier
dc.contributor.authorCroes, Kristof
dc.contributor.authorContino, Antonino
dc.contributor.authorVandersmissen, Kevin
dc.contributor.authorGao, Weimin
dc.contributor.authorMatagne, Philippe
dc.contributor.authorBadaroglu, Mustafa
dc.contributor.authorWilson, Chris
dc.contributor.authorMocuta, Dan
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-24T03:29:52Z
dc.date.available2021-10-24T03:29:52Z
dc.date.issued2017
dc.identifier.issn0018-9383
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28036
dc.sourceIIOimport
dc.titleModeling of via resistance for advanced technology nodes
dc.typeJournal article
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorBaert, Rogier
dc.contributor.imecauthorCroes, Kristof
dc.contributor.imecauthorContino, Antonino
dc.contributor.imecauthorVandersmissen, Kevin
dc.contributor.imecauthorMatagne, Philippe
dc.contributor.imecauthorBadaroglu, Mustafa
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecCroes, Kristof::0000-0002-3955-0638
dc.source.peerreviewyes
dc.source.beginpage2306
dc.source.endpage2313
dc.source.journalIEEE Transactions on Electron Devices
dc.source.issue5
dc.source.volume64
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7895180/
imec.availabilityPublished - imec


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