Show simple item record

Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations

dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorPapvieros, George
dc.contributor.authorGogolides, Evangelos
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorPathangi Sriraman, Hari
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-24T03:35:00Z
dc.date.available2021-10-24T03:35:00Z
dc.date.issued2017
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28062
dc.sourceIIOimport
dc.titleChallenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations
dc.typeJournal article
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage24001
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue2
dc.source.volume16
dc.identifier.urlhttps://doi.org/10.1117/1.JMM.16.2.024001
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
39636.pdf
Size:
4.221Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record