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Patterning challenges for ultimate CMOS and beyond CMOS nano-fabrication

dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorPiumi, Daniele
dc.date.accessioned2021-10-24T03:49:51Z
dc.date.available2021-10-24T03:49:51Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28131
dc.sourceIIOimport
dc.titlePatterning challenges for ultimate CMOS and beyond CMOS nano-fabrication
dc.typeProceedings paper
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.source.peerreviewno
dc.source.conferenceiPlasmaNano-VIII
dc.source.conferencedate2/07/2017
dc.source.conferencelocationAntwerpen Belgium
dc.identifier.urlhttp://iplasmanano.org/
imec.availabilityPublished - imec
imec.internalnotesInvited talk


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