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Tone reversal technology development targeting below 5nm technology node applications

dc.contributor.authorDecoster, Stefan
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorPiao, Xiaoyu
dc.contributor.authorFeurprier, Yannick
dc.contributor.authorRassoul, Nouredine
dc.contributor.authorPiumi, Daniele
dc.date.accessioned2021-10-24T04:05:03Z
dc.date.available2021-10-24T04:05:03Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28195
dc.sourceIIOimport
dc.titleTone reversal technology development targeting below 5nm technology node applications
dc.typeMeeting abstract
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorPiao, Xiaoyu
dc.contributor.imecauthorFeurprier, Yannick
dc.contributor.imecauthorRassoul, Nouredine
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecRassoul, Nouredine::0000-0001-9489-3396
dc.source.peerreviewyes
dc.source.conferenceAVS 64th International Symposium and Exhibition
dc.source.conferencedate29/10/2017
dc.source.conferencelocationTampa, FL USA
dc.identifier.urlhttp://www2.avs.org/symposium2017/Papers/Paper_PS-WeM11.html
imec.availabilityPublished - imec


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