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CD-SEM distortion quantification for EPE metrology and contour analysis

dc.contributor.authorDillen, Harm
dc.contributor.authorKiers, Ton
dc.contributor.authorHalder, Sandip
dc.contributor.authorWallow, Thomas I.
dc.contributor.authorVan Roey, Frieda
dc.date.accessioned2021-10-24T04:20:17Z
dc.date.available2021-10-24T04:20:17Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28253
dc.sourceIIOimport
dc.titleCD-SEM distortion quantification for EPE metrology and contour analysis
dc.typeProceedings paper
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2260664
dc.source.peerreviewyes
dc.source.beginpage1014515
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXI
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesSPIE Proceedings; Vol. 10145


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