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Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration

dc.contributor.authorD'Urzo, Lucia
dc.contributor.authorBayana, Hareen
dc.contributor.authorVandereyken, Jelle
dc.contributor.authorFoubert, Philippe
dc.contributor.authorWu, Aiwen
dc.contributor.authorJaber, Jad
dc.contributor.authorHamzik, James
dc.date.accessioned2021-10-24T04:30:20Z
dc.date.available2021-10-24T04:30:20Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28289
dc.sourceIIOimport
dc.titleContinuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration
dc.typeProceedings paper
dc.contributor.imecauthorD'Urzo, Lucia
dc.contributor.imecauthorBayana, Hareen
dc.contributor.imecauthorVandereyken, Jelle
dc.contributor.imecauthorFoubert, Philippe
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2258582
dc.source.peerreviewyes
dc.source.beginpage101462A
dc.source.conferenceAdvances in Patterning Materials and Processes XXXIV
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10146


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