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dc.contributor.authorDutta, Shibesh
dc.contributor.authorKundu, Shreya
dc.contributor.authorGupta, Anshul
dc.contributor.authorJamieson, Geraldine
dc.contributor.authorGomez Granados, Juan Fernando
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorWilson, Chris
dc.contributor.authorTokei, Zsolt
dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2021-10-24T04:30:57Z
dc.date.available2021-10-24T04:30:57Z
dc.date.issued2017
dc.identifier.issn0741-3106
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28291
dc.sourceIIOimport
dc.titleHighly scaled ruthenium interconnects
dc.typeJournal article
dc.contributor.imecauthorKundu, Shreya
dc.contributor.imecauthorGupta, Anshul
dc.contributor.imecauthorJamieson, Geraldine
dc.contributor.imecauthorGomez Granados, Juan Fernando
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecJamieson, Geraldine::0000-0002-6750-097X
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpage949
dc.source.endpage951
dc.source.journalIEEE Electron Device Letters
dc.source.issue7
dc.source.volume38
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7934397/
imec.availabilityPublished - imec


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