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Progress in 193 nm photoresists and related process technologies

dc.contributor.authorOkoroanyanwu, U.
dc.contributor.authorLevinson, H.
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Roey, Frieda
dc.date.accessioned2021-10-01T08:36:34Z
dc.date.available2021-10-01T08:36:34Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2830
dc.sourceIIOimport
dc.titleProgress in 193 nm photoresists and related process technologies
dc.typeProceedings paper
dc.contributor.imecauthorVan Roey, Frieda
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1
dc.source.endpage34
dc.source.conferenceProceedings of the Microlithography Symposium. Interface '98
dc.source.conferencedate15/11/1998
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - open access


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