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Lithographic process studies of 193 nm photoresists from six major commercial suppliers

dc.contributor.authorOkoroanyanwu, U.
dc.contributor.authorLevinson, H.
dc.contributor.authorGoethals, Mieke
dc.contributor.authorVan Roey, Frieda
dc.date.accessioned2021-10-01T08:36:41Z
dc.date.available2021-10-01T08:36:41Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2831
dc.sourceIIOimport
dc.titleLithographic process studies of 193 nm photoresists from six major commercial suppliers
dc.typeMeeting abstract
dc.contributor.imecauthorVan Roey, Frieda
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference193nm '98. At the Peak. 4th International Symposium on 193 nm Lithography. Abstracts Book
dc.source.conferencedate14/09/1998
dc.source.conferencelocationTelfs Austria
imec.availabilityPublished - open access


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