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dc.contributor.authorFranke, Joern-Holger
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorHalder, Sandip
dc.date.accessioned2021-10-24T04:49:34Z
dc.date.available2021-10-24T04:49:34Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28352
dc.sourceIIOimport
dc.titleEPE analysis of sub-N10 BEOL structures with Coventor's SEMulator3D
dc.typeMeeting abstract
dc.contributor.imecauthorFranke, Joern-Holger
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorHalder, Sandip
dc.contributor.orcidimecFranke, Joern-Holger::0000-0002-3571-1633
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.source.peerreviewyes
dc.source.beginpage1014529
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXI
dc.source.conferencedate25/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2258195
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10145


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