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Reticle enhancement techniques toward iN7 metal2

dc.contributor.authorGillijns, Werner
dc.contributor.authorTan, Ling Ee
dc.contributor.authorBlanco, Victor
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorGallagher, Emily
dc.contributor.authorMcIntyre, Greg
dc.date.accessioned2021-10-24T05:05:08Z
dc.date.available2021-10-24T05:05:08Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28399
dc.sourceIIOimport
dc.titleReticle enhancement techniques toward iN7 metal2
dc.typeProceedings paper
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1014314
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate27/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2258003
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10143


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