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Bottom-ARC optimization methodology for 0.25μm lithography and beyond

dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorJaenen, Patrick
dc.contributor.authorFeng, Hong Zhang
dc.contributor.authorDelvaux, Christie
dc.contributor.authorRichardson, Paul
dc.contributor.authorVan Puyenbroeck, Ilse
dc.contributor.authorRonse, Kurt
dc.contributor.authorLamb, J. E.
dc.contributor.authorvan der Hilst, J. B. C.
dc.contributor.authorvan Wingerden, Johannes
dc.date.accessioned2021-10-01T08:37:47Z
dc.date.available2021-10-01T08:37:47Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2840
dc.sourceIIOimport
dc.titleBottom-ARC optimization methodology for 0.25μm lithography and beyond
dc.typeProceedings paper
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage322
dc.source.endpage336
dc.source.conferenceOptical Microlithography XI
dc.source.conferencedate25/02/1998
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 3334


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