Modulating the resistivity of MoS2 through low energy phosphorus plasma implantation
dc.contributor.author | Haynes, K. | |
dc.contributor.author | Murray, R. | |
dc.contributor.author | Weinrich, Z. | |
dc.contributor.author | Zhao, X. | |
dc.contributor.author | Chiappe, Daniele | |
dc.contributor.author | Sutar, Surajit | |
dc.contributor.author | Radu, Iuliana | |
dc.contributor.author | Hatem, C. | |
dc.contributor.author | Perry, S | |
dc.contributor.author | Jones, K | |
dc.date.accessioned | 2021-10-24T05:31:52Z | |
dc.date.available | 2021-10-24T05:31:52Z | |
dc.date.issued | 2017 | |
dc.identifier.issn | 0003-6951 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/28473 | |
dc.source | IIOimport | |
dc.title | Modulating the resistivity of MoS2 through low energy phosphorus plasma implantation | |
dc.type | Journal article | |
dc.contributor.imecauthor | Sutar, Surajit | |
dc.contributor.imecauthor | Radu, Iuliana | |
dc.contributor.orcidimec | Radu, Iuliana::0000-0002-7230-7218 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 262102 | |
dc.source.journal | Applied Physics Letters | |
dc.source.issue | 26 | |
dc.source.volume | 110 | |
dc.identifier.url | http://aip.scitation.org/doi/full/10.1063/1.4989829 | |
imec.availability | Published - open access |