Show simple item record

Modulating the resistivity of MoS2 through low energy phosphorus plasma implantation

dc.contributor.authorHaynes, K.
dc.contributor.authorMurray, R.
dc.contributor.authorWeinrich, Z.
dc.contributor.authorZhao, X.
dc.contributor.authorChiappe, Daniele
dc.contributor.authorSutar, Surajit
dc.contributor.authorRadu, Iuliana
dc.contributor.authorHatem, C.
dc.contributor.authorPerry, S
dc.contributor.authorJones, K
dc.date.accessioned2021-10-24T05:31:52Z
dc.date.available2021-10-24T05:31:52Z
dc.date.issued2017
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28473
dc.sourceIIOimport
dc.titleModulating the resistivity of MoS2 through low energy phosphorus plasma implantation
dc.typeJournal article
dc.contributor.imecauthorSutar, Surajit
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage262102
dc.source.journalApplied Physics Letters
dc.source.issue26
dc.source.volume110
dc.identifier.urlhttp://aip.scitation.org/doi/full/10.1063/1.4989829
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
37340.pdf
Size:
869.9Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record