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Selective patterning of amorphous silicon on MoS2 for enabling transition-metal dichalcogenide heterostructures

dc.contributor.authorHeyne, Markus
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorGoodyear, Andy
dc.contributor.authorCooke, Mike
dc.contributor.authorRadu, Iuliana
dc.contributor.authorNeyts, Erik C.
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-24T05:42:57Z
dc.date.available2021-10-24T05:42:57Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28504
dc.sourceIIOimport
dc.titleSelective patterning of amorphous silicon on MoS2 for enabling transition-metal dichalcogenide heterostructures
dc.typeMeeting abstract
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceMRS Spring Meeting
dc.source.conferencedate17/04/2017
dc.source.conferencelocationPhoenix USA
dc.identifier.urlhttps://mrsspring.zerista.com/poster/member/84886
imec.availabilityPublished - imec
imec.internalnotesPoster NM1.5.06


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