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Investigation of Cl2 etch in view of extremely low temperature selective epitaxial processes

dc.contributor.authorHikavyy, Andriy
dc.contributor.authorKruv, Anastaiia
dc.contributor.authorVan Opstal, Tinneke
dc.contributor.authorPorret, Clément
dc.contributor.authorLoo, Roger
dc.date.accessioned2021-10-24T05:46:23Z
dc.date.available2021-10-24T05:46:23Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28513
dc.sourceIIOimport
dc.titleInvestigation of Cl2 etch in view of extremely low temperature selective epitaxial processes
dc.typeProceedings paper
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorVan Opstal, Tinneke
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewyes
dc.source.conference10th International Conference on Silicon Epitaxy and Heterostructures - ICSI-10
dc.source.conferencedate14/05/2017
dc.source.conferencelocationWarwick UK
imec.availabilityPublished - imec


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