Mechanical stress evolution and the Blech length: 2D simulation of early electromigration effects
dc.contributor.author | Petrescu, Violeta | |
dc.contributor.author | Mouthaan, T. | |
dc.contributor.author | Schoenmaker, Wim | |
dc.contributor.author | Salm, C. | |
dc.date.accessioned | 2021-10-01T08:39:24Z | |
dc.date.available | 2021-10-01T08:39:24Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2852 | |
dc.source | IIOimport | |
dc.title | Mechanical stress evolution and the Blech length: 2D simulation of early electromigration effects | |
dc.type | Proceedings paper | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 1047 | |
dc.source.endpage | 1050 | |
dc.source.conference | Proceedings of the 9th European Symposium on Reliability of Electron Devices and Failure Physics - ESREF | |
dc.source.conferencedate | 5/10/1998 | |
dc.source.conferencelocation | Copenhagen Denmark | |
imec.availability | Published - open access | |
imec.internalnotes | Special issue Microelectronics Reliability; Vol. 38 |