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Metal sensitizer in chemically amplified EUV resist: a study of sensitivity enhancement and dissolution
Publication:
Metal sensitizer in chemically amplified EUV resist: a study of sensitivity enhancement and dissolution
Date
2017
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jiang, Jing
;
De Simone, Danilo
;
Vandenberghe, Geert
Journal
Journal of Photopolymer Science and Technology
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1852
since deposited on 2021-10-24
Acq. date: 2025-10-25
Citations
Metrics
Views
1852
since deposited on 2021-10-24
Acq. date: 2025-10-25
Citations