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Metal sensitizer in chemically amplified EUV resist: a study of sensitivity enhancement and dissolution

dc.contributor.authorJiang, Jing
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-24T06:22:29Z
dc.date.available2021-10-24T06:22:29Z
dc.date.issued2017
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28604
dc.sourceIIOimport
dc.titleMetal sensitizer in chemically amplified EUV resist: a study of sensitivity enhancement and dissolution
dc.typeJournal article
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage591
dc.source.endpage597
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue5
dc.source.volume30
dc.identifier.urlhttps://www.jstage.jst.go.jp/article/photopolymer/30/5/30_591/_article
imec.availabilityPublished - open access
imec.internalnotes


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