Show simple item record

Overcoming EUV mask blank defects: what we can, and what we should

dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-24T06:24:25Z
dc.date.available2021-10-24T06:24:25Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28609
dc.sourceIIOimport
dc.titleOvercoming EUV mask blank defects: what we can, and what we should
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage104540M
dc.source.conferencePhotomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
dc.source.conferencedate5/04/2017
dc.source.conferencelocationYokohama Japan
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2644787
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10454


Files in this item

Thumbnail
Name:
36123.pdf
Size:
9.254Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record