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In-line atomic resolution local nanotopography variation metrology for CMP process

dc.contributor.authorKim, Tae-Gon
dc.contributor.authorHeylen, Nancy
dc.contributor.authorKim, Soon-Wook
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorJo, Ah-jin
dc.contributor.authorLee, Ju Suk
dc.contributor.authorAhn, Byoung-Woon
dc.contributor.authorCho, Sang-Joon
dc.contributor.authorPark, Sang-il
dc.contributor.authorImer, Bernd
dc.contributor.authorShmidt, Sebastian
dc.date.accessioned2021-10-24T06:57:24Z
dc.date.available2021-10-24T06:57:24Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28685
dc.sourceIIOimport
dc.titleIn-line atomic resolution local nanotopography variation metrology for CMP process
dc.typeProceedings paper
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.imecauthorKim, Soon-Wook
dc.contributor.imecauthorVandeweyer, Tom
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage77
dc.source.endpage82
dc.source.conferenceInternational Conference on Planarization/ CMP Technology -ICPT
dc.source.conferencedate11/10/2017
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8237955/
imec.availabilityPublished - open access


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