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Economical shallow emitter formation by plasma immersion ion implantation and RTA process

dc.contributor.authorPinter, Istvan
dc.contributor.authorDusco, C.
dc.contributor.authorKhanh, N. Q.
dc.contributor.authorAdam, M.
dc.contributor.authorMakaro, Z.
dc.contributor.authorBarsony, I.
dc.contributor.authorSivoththaman, Sivanarayanamoorthy
dc.contributor.authorPoortmans, Jef
dc.contributor.authorAdriaenssens, G.
dc.date.accessioned2021-10-01T08:41:40Z
dc.date.available2021-10-01T08:41:40Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2868
dc.sourceIIOimport
dc.titleEconomical shallow emitter formation by plasma immersion ion implantation and RTA process
dc.typeProceedings paper
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1475
dc.source.endpage1478
dc.source.conference2nd World Conference and Exhibition on Photovoltaic Solar Energy Conversion
dc.source.conferencedate6/07/1998
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access


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