dc.contributor.author | Kljucar, Luka | |
dc.contributor.author | Gonzalez, Mario | |
dc.contributor.author | Croes, Kristof | |
dc.contributor.author | De Wolf, Ingrid | |
dc.contributor.author | De Messemaeker, Joke | |
dc.contributor.author | Murdoch, Gayle | |
dc.contributor.author | Nolmans, Philip | |
dc.contributor.author | De Vos, Joeri | |
dc.contributor.author | Boemmels, Juergen | |
dc.contributor.author | Tokei, Zsolt | |
dc.date.accessioned | 2021-10-24T07:00:15Z | |
dc.date.available | 2021-10-24T07:00:15Z | |
dc.date.issued | 2017 | |
dc.identifier.issn | 0026-2714 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/28691 | |
dc.source | IIOimport | |
dc.title | Impact of via density and passivation thickness on the mechanical integrity of advanced Back-End-Of-Line interconnects | |
dc.type | Journal article | |
dc.contributor.imecauthor | Kljucar, Luka | |
dc.contributor.imecauthor | Gonzalez, Mario | |
dc.contributor.imecauthor | Croes, Kristof | |
dc.contributor.imecauthor | De Wolf, Ingrid | |
dc.contributor.imecauthor | De Messemaeker, Joke | |
dc.contributor.imecauthor | Murdoch, Gayle | |
dc.contributor.imecauthor | Nolmans, Philip | |
dc.contributor.imecauthor | De Vos, Joeri | |
dc.contributor.imecauthor | Boemmels, Juergen | |
dc.contributor.imecauthor | Tokei, Zsolt | |
dc.contributor.orcidimec | Croes, Kristof::0000-0002-3955-0638 | |
dc.contributor.orcidimec | De Wolf, Ingrid::0000-0003-3822-5953 | |
dc.contributor.orcidimec | De Vos, Joeri::0000-0002-9332-9336 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 297 | |
dc.source.endpage | 305 | |
dc.source.journal | Microelectronics Reliability | |
dc.source.volume | 79 | |
dc.identifier.url | http://www.sciencedirect.com/science/article/pii/S0026271417303013 | |
imec.availability | Published - imec | |