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Introducing 193 nm lithography

dc.contributor.authorPollers, Ingrid
dc.contributor.authorJaenen, Patrick
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorDavies, G.
dc.contributor.authorHeskamp, B.
dc.contributor.authorBakker, H.
dc.contributor.authorMcCoo, E.
dc.contributor.authorMulkens, J.
dc.contributor.authorStoeldraijer, J.
dc.contributor.authorSytsma, J.
dc.contributor.authorVan der Vleuten, B.
dc.contributor.authorVleeming, Bert
dc.contributor.authorTzviatkov, Plamen
dc.contributor.authorVan Driessche, Veerle
dc.contributor.authorSlater, S.
dc.date.accessioned2021-10-01T08:42:02Z
dc.date.available2021-10-01T08:42:02Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2870
dc.sourceIIOimport
dc.titleIntroducing 193 nm lithography
dc.typeProceedings paper
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan Driessche, Veerle
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage179
dc.source.endpage198
dc.source.conferenceProceedings of the Microlithography Symposium. Interface '98
dc.source.conferencedate15/11/1998
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - open access


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