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Experimental characterization of NTD rResist shrinkage

dc.contributor.authorKuchler, Bernd
dc.contributor.authorMulders, Thomas
dc.contributor.authorTaoka, Hironobu
dc.contributor.authorGao, Weimin
dc.contributor.authorKlostermann, Ulrich
dc.contributor.authorKamimura, Sou
dc.contributor.authorGrozev, Grozdan
dc.contributor.authorMasahiro, Yoshidome
dc.contributor.authorShirakawa, Michihiro
dc.contributor.authorLi, Waikin
dc.date.accessioned2021-10-24T07:10:15Z
dc.date.available2021-10-24T07:10:15Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28714
dc.sourceIIOimport
dc.titleExperimental characterization of NTD rResist shrinkage
dc.typeProceedings paper
dc.contributor.imecauthorGao, Weimin
dc.contributor.imecauthorGrozev, Grozdan
dc.contributor.imecauthorLi, Waikin
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2256568
dc.source.peerreviewyes
dc.source.beginpage101470F
dc.source.conferenceOptical Microlithography XXX
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10147


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