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dc.contributor.authorKundu, Shreya
dc.contributor.authorDutta, Shibesh
dc.contributor.authorGupta, Anshul
dc.contributor.authorJamieson, Geraldine
dc.contributor.authorPiumi, Daniele
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorWilson, Chris
dc.contributor.authorTokei, Zsolt
dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2021-10-24T07:15:15Z
dc.date.available2021-10-24T07:15:15Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28725
dc.sourceIIOimport
dc.titleDirect metal nanowire patterning using ion beam etch
dc.typeMeeting abstract
dc.contributor.imecauthorKundu, Shreya
dc.contributor.imecauthorGupta, Anshul
dc.contributor.imecauthorJamieson, Geraldine
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecJamieson, Geraldine::0000-0002-6750-097X
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpagePS-WeM13
dc.source.conferenceAVS 64th International Symposium and Exhibition
dc.source.conferencedate29/10/2017
dc.source.conferencelocationTampa, FL USA
dc.identifier.urlhttp://www2.avs.org/symposium2017/Papers/Paper_PS-WeM13.html
imec.availabilityPublished - imec


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