dc.contributor.author | Li, Waikin | |
dc.contributor.author | Mao, Ming | |
dc.contributor.author | Trivkovic, Darko | |
dc.contributor.author | Murdoch, Gayle | |
dc.contributor.author | Halder, Sandip | |
dc.contributor.author | Ercken, Monique | |
dc.date.accessioned | 2021-10-24T07:51:13Z | |
dc.date.available | 2021-10-24T07:51:13Z | |
dc.date.issued | 2017 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/28807 | |
dc.source | IIOimport | |
dc.title | imec's iN5 BEOL patterning development | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Li, Waikin | |
dc.contributor.imecauthor | Mao, Ming | |
dc.contributor.imecauthor | Trivkovic, Darko | |
dc.contributor.imecauthor | Murdoch, Gayle | |
dc.contributor.imecauthor | Halder, Sandip | |
dc.contributor.imecauthor | Ercken, Monique | |
dc.contributor.orcidimec | Halder, Sandip::0000-0002-6314-2685 | |
dc.source.peerreview | yes | |
dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | 11/09/2017 | |
dc.source.conferencelocation | Monterey, CA USA | |
imec.availability | Published - imec | |