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Resist free photo-ionic metal deposition on 2D materials

dc.contributor.authorLockhart de la Rosa, Cesar Javier
dc.contributor.authorXia, Kang
dc.contributor.authorChiang, Weiyi
dc.contributor.authorArutchelvan, Goutham
dc.contributor.authorFujita, Yasuhiko
dc.contributor.authorToyouchi, Toyo
dc.contributor.authorYuan, Haifeng
dc.contributor.authorSu, Jia
dc.contributor.authorUhi-i, Hiroshi
dc.contributor.authorHofkens, Johan
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDe Feyter, Steven
dc.date.accessioned2021-10-24T08:10:38Z
dc.date.available2021-10-24T08:10:38Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28847
dc.sourceIIOimport
dc.titleResist free photo-ionic metal deposition on 2D materials
dc.typeMeeting abstract
dc.contributor.imecauthorLockhart de la Rosa, Cesar Javier
dc.contributor.imecauthorArutchelvan, Goutham
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage2.11
dc.source.conference48th IEEE Semiconductor Interface Specialists Conference - SISC
dc.source.conferencedate6/12/2017
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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