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Enabling CD SEM metrology for 5nm technology node and beyond

dc.contributor.authorLorusso, Gian
dc.contributor.authorOhashi, Takeyoshi
dc.contributor.authorYamaguchi, Astuko
dc.contributor.authorInoue, Osamu
dc.contributor.authorSutani, Takumichi
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorWilson, Chris
dc.contributor.authorBriggs, Basoene
dc.contributor.authorTan, Chi Lim
dc.contributor.authorRaymaekers, Tom
dc.contributor.authorDelhougne, Romain
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorDi Piazza, Luca
dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorFurnemont, Arnaud
dc.contributor.authorFantini, Andrea
dc.contributor.authorDonadio, Gabriele Luca
dc.contributor.authorSouriau, Laurent
dc.contributor.authorCrotti, Davide
dc.contributor.authorYasin, Farrukh
dc.contributor.authorAppeltans, Raf
dc.contributor.authorRao, Siddharth
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorLeray, Philippe
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorZhou, Daisy
dc.contributor.authorVeloso, Anabela
dc.contributor.authorCollaert, Nadine
dc.contributor.authorHasumi, Kazuhisa
dc.contributor.authorKoshihara, Shunsuke
dc.contributor.authorIkota, Masami
dc.contributor.authorOkagawa, Yutaka
dc.contributor.authorIshimoto, Toru
dc.date.accessioned2021-10-24T08:16:11Z
dc.date.available2021-10-24T08:16:11Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28857
dc.sourceIIOimport
dc.titleEnabling CD SEM metrology for 5nm technology node and beyond
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorDelhougne, Romain
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorDi Piazza, Luca
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.imecauthorFurnemont, Arnaud
dc.contributor.imecauthorFantini, Andrea
dc.contributor.imecauthorDonadio, Gabriele Luca
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorCrotti, Davide
dc.contributor.imecauthorYasin, Farrukh
dc.contributor.imecauthorAppeltans, Raf
dc.contributor.imecauthorRao, Siddharth
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorZhou, Daisy
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecFurnemont, Arnaud::0000-0002-6378-1030
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecYasin, Farrukh::0000-0002-7295-0254
dc.contributor.orcidimecRao, Siddharth::0000-0001-6161-3052
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2257468
dc.source.peerreviewyes
dc.source.beginpage1014512
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXI
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10145


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