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Photolithography as enabler of AMOLED displays beyond 1000 ppi

dc.contributor.authorMalinowski, Pawel
dc.contributor.authorKe, Tung Huei
dc.contributor.authorNakamura, Atsushi
dc.contributor.authorVicca, Peter
dc.contributor.authorKronemeijer, Auke
dc.contributor.authorAmeys, Marc
dc.contributor.authorvan der Steen, Jan-Laurens
dc.contributor.authorSteudel, Soeren
dc.contributor.authorKamochi, Yoshitaka
dc.contributor.authorIwai, Yu
dc.contributor.authorGelinck, Gerwin
dc.contributor.authorHeremans, Paul
dc.date.accessioned2021-10-24T08:37:59Z
dc.date.available2021-10-24T08:37:59Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28903
dc.sourceIIOimport
dc.titlePhotolithography as enabler of AMOLED displays beyond 1000 ppi
dc.typeProceedings paper
dc.contributor.imecauthorMalinowski, Pawel
dc.contributor.imecauthorKe, Tung Huei
dc.contributor.imecauthorKronemeijer, Auke
dc.contributor.imecauthorAmeys, Marc
dc.contributor.imecauthorvan der Steen, Jan-Laurens
dc.contributor.imecauthorHeremans, Paul
dc.contributor.orcidimecMalinowski, Pawel::0000-0002-2934-470X
dc.contributor.orcidimecKe, Tung Huei::0000-0001-8381-4998
dc.contributor.orcidimecAmeys, Marc::0000-0001-7140-2101
dc.contributor.orcidimecHeremans, Paul::0000-0003-2151-1718
dc.source.peerreviewyes
dc.source.beginpage623
dc.source.endpage626
dc.source.conferenceSID Symposium
dc.source.conferencedate21/05/2017
dc.source.conferencelocationLos Angeles, CA USA
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/sdtp.11715/abstract
imec.availabilityPublished - imec
imec.internalnotesSID Symposium Digest of Technical Papers; Vol. 48


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