dc.contributor.author | Ramage, R. W. | |
dc.contributor.author | Vos, Rita | |
dc.contributor.author | Meuris, Marc | |
dc.contributor.author | Lux, Marcel | |
dc.date.accessioned | 2021-10-01T08:45:32Z | |
dc.date.available | 2021-10-01T08:45:32Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2892 | |
dc.source | IIOimport | |
dc.title | Deposition of trace metals to a wafer surface from lithography materials | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Vos, Rita | |
dc.contributor.imecauthor | Meuris, Marc | |
dc.contributor.imecauthor | Lux, Marcel | |
dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 941 | |
dc.source.endpage | 952 | |
dc.source.conference | Advances in Resist Technology and Processing XV | |
dc.source.conferencedate | 23/02/1998 | |
dc.source.conferencelocation | Santa Clara, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 3333 | |