Lithography simulation with aerial image-variable threshold resist model
dc.contributor.author | Randall, John | |
dc.contributor.author | Gangala, Hareen K | |
dc.contributor.author | Tritchkov, Alexander | |
dc.date.accessioned | 2021-10-01T08:45:41Z | |
dc.date.available | 2021-10-01T08:45:41Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2893 | |
dc.source | IIOimport | |
dc.title | Lithography simulation with aerial image-variable threshold resist model | |
dc.type | Oral presentation | |
dc.source.peerreview | no | |
dc.source.conference | MNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium. | |
dc.source.conferencelocation | ||
imec.availability | Published - imec |
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