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Dopant segregation and diffusion in CVD epitaxial Grown Ge

dc.contributor.authorMurota, Junichi
dc.contributor.authorYamamoto, Yuchi
dc.contributor.authorCostina, Ioan
dc.contributor.authorBaerwolf, Florian
dc.contributor.authorTillack, Bernd
dc.contributor.authorLe Thanh, Vinh
dc.contributor.authorLoo, Roger
dc.contributor.authorDouhard, Bastien
dc.contributor.authorAyyad, Mustafa
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-24T09:48:36Z
dc.date.available2021-10-24T09:48:36Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29041
dc.sourceIIOimport
dc.titleDopant segregation and diffusion in CVD epitaxial Grown Ge
dc.typeMeeting abstract
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorAyyad, Mustafa
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewyes
dc.source.conference6th International Workshop on Nanotechnology and Application - IWNA
dc.source.conferencedate8/11/2017
dc.source.conferencelocationPhan Thiet Vietnam
imec.availabilityPublished - imec


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