dc.contributor.author | Nagahara, Seiji | |
dc.contributor.author | Carcasi, Michael | |
dc.contributor.author | Shiraishi, Gosuke | |
dc.contributor.author | Nakagawa, Hisashi | |
dc.contributor.author | Dei, Satoshi | |
dc.contributor.author | Shiozawa, Takahiro | |
dc.contributor.author | Nafus, Kathleen | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Stock, Hans-Jürgen | |
dc.contributor.author | Küchler, Bernd | |
dc.contributor.author | Hori, Masafumi | |
dc.contributor.author | Naruoka, Takehiko | |
dc.contributor.author | Nagai, Tomoki | |
dc.contributor.author | Minekawa, Yukie | |
dc.contributor.author | Iseki, Tomohiri | |
dc.contributor.author | Kondo, Yoshihiro | |
dc.contributor.author | Yoshihara, Kosuke | |
dc.contributor.author | Kamei, Yuya | |
dc.contributor.author | Tomono, Masaru | |
dc.contributor.author | Shimada, Ryo | |
dc.contributor.author | Biesemans, Serge | |
dc.contributor.author | Nakashima, Hideo | |
dc.contributor.author | Foubert, Philippe | |
dc.contributor.author | Buitrago, Elizabeth | |
dc.contributor.author | Vockenhuber, Michaela | |
dc.contributor.author | Ekinci, Yasin | |
dc.contributor.author | Oshima, Akihiro | |
dc.contributor.author | Tagawa, Seiichi | |
dc.date.accessioned | 2021-10-24T09:57:09Z | |
dc.date.available | 2021-10-24T09:57:09Z | |
dc.date.issued | 2017 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/29057 | |
dc.source | IIOimport | |
dc.title | Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Nafus, Kathleen | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Naruoka, Takehiko | |
dc.contributor.imecauthor | Biesemans, Serge | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.identifier.doi | 10.1117/12.2258217 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 101460G | |
dc.source.conference | Advances in Patterning Materials and Processes XXXIV | |
dc.source.conferencedate | 26/02/2017 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE; Vol. 10146 | |