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High-throughput multi-beam SEM: quantitative analysis of imaging capabilities at imec-N10 logic node

dc.contributor.authorNeumann, J.T.
dc.contributor.authorGarbowski, T.
dc.contributor.authorHögele, W.
dc.contributor.authorKorb, T.
dc.contributor.authorHalder, Sandip
dc.contributor.authorLeray, Philippe
dc.contributor.authorGarreis, R.
dc.contributor.authorle Maire, M.
dc.contributor.authorZeidler, D.
dc.date.accessioned2021-10-24T10:07:05Z
dc.date.available2021-10-24T10:07:05Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29076
dc.sourceIIOimport
dc.titleHigh-throughput multi-beam SEM: quantitative analysis of imaging capabilities at imec-N10 logic node
dc.typeProceedings paper
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2257980
dc.source.peerreviewyes
dc.source.beginpage101451S
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXI
dc.source.conferencedate25/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10145


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