dc.contributor.author | Otsuji, Masayuki | |
dc.contributor.author | Yoshida, Yukifumi | |
dc.contributor.author | Takahashi, Hiroaki | |
dc.contributor.author | Sebaai, Farid | |
dc.contributor.author | Wostyn, Kurt | |
dc.contributor.author | Holsteyns, Frank | |
dc.contributor.author | Sato, Masanobu | |
dc.contributor.author | Shirakawa, Hajime | |
dc.date.accessioned | 2021-10-24T10:32:38Z | |
dc.date.available | 2021-10-24T10:32:38Z | |
dc.date.issued | 2017 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/29123 | |
dc.source | IIOimport | |
dc.title | Surface preparation and wet cleaning for germanium surface | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Sebaai, Farid | |
dc.contributor.imecauthor | Wostyn, Kurt | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.orcidimec | Wostyn, Kurt::0000-0003-3995-0292 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 160 | |
dc.source.endpage | 161 | |
dc.source.conference | IEEE Electron Devices Technology and Manufacturing Conference - EDTM | |
dc.source.conferencedate | 28/02/2017 | |
dc.source.conferencelocation | Toyama Japan | |
dc.identifier.url | https://ieeexplore.ieee.org/document/7947551 | |
imec.availability | Published - open access | |