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dc.contributor.authorOtsuji, Masayuki
dc.contributor.authorYoshida, Yukifumi
dc.contributor.authorTakahashi, Hiroaki
dc.contributor.authorSebaai, Farid
dc.contributor.authorWostyn, Kurt
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorSato, Masanobu
dc.contributor.authorShirakawa, Hajime
dc.date.accessioned2021-10-24T10:32:38Z
dc.date.available2021-10-24T10:32:38Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29123
dc.sourceIIOimport
dc.titleSurface preparation and wet cleaning for germanium surface
dc.typeProceedings paper
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage160
dc.source.endpage161
dc.source.conferenceIEEE Electron Devices Technology and Manufacturing Conference - EDTM
dc.source.conferencedate28/02/2017
dc.source.conferencelocationToyama Japan
dc.identifier.urlhttps://ieeexplore.ieee.org/document/7947551
imec.availabilityPublished - open access


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