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CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing

dc.contributor.authorRonse, Kurt
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorMarschner, Thomas
dc.contributor.authorVan den hove, Luc
dc.contributor.authorStreefkerk, B.
dc.contributor.authorFinders, Jo
dc.contributor.authorvan Schoot, J.
dc.contributor.authorLuehrmann, P.
dc.contributor.authorMinvielle, A.
dc.date.accessioned2021-10-01T08:49:10Z
dc.date.available2021-10-01T08:49:10Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2913
dc.sourceIIOimport
dc.titleCD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage56
dc.source.endpage66
dc.source.conferenceOptical Microlithography XI
dc.source.conferencedate25/02/1998
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 3334


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