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New approach to optical proximity correction

dc.contributor.authorRosenbusch, A.
dc.contributor.authorHourd, A.
dc.contributor.authorJuffermans, C.
dc.contributor.authorKirsch, H.
dc.contributor.authorLalanne, F.
dc.contributor.authorMaurer, W.
dc.contributor.authorRomeo, C.
dc.contributor.authorRonse, Kurt
dc.contributor.authorSchiavone, P.
dc.contributor.authorSimecek, M.
dc.contributor.authorToublan, O.
dc.contributor.authorWatson, J.
dc.contributor.authorZiegler, W.
dc.contributor.authorZimmermann, R.
dc.date.accessioned2021-10-01T08:49:24Z
dc.date.available2021-10-01T08:49:24Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2914
dc.sourceIIOimport
dc.titleNew approach to optical proximity correction
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage585
dc.source.endpage593
dc.source.conference18th Annual Bacus Symposium on Photomask Technology and Management
dc.source.conferencedate16/09/1998
dc.source.conferencelocationRedwood City, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 3546


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