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Single element and metal alloy novel EUV mask absorbers for improved imaging

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorSouriau, Laurent
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorHendrickx, Eric
dc.contributor.authorScholze, Frank
dc.contributor.authorLaubis, Christian
dc.contributor.authorKruemberg, Jens
dc.contributor.authorReuter, Christian
dc.date.accessioned2021-10-24T10:57:55Z
dc.date.available2021-10-24T10:57:55Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29170
dc.sourceIIOimport
dc.titleSingle element and metal alloy novel EUV mask absorbers for improved imaging
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpage104500G
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithpgraphy - EUVL
dc.source.conferencedate11/09/2017
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/10450/104500G/Single-element-and-metal-alloy-novel-EUV-mask-ab
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10450


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