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Reducing EUV mask 3D effects by alternative metal absorbers

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorSouriau, Laurent
dc.contributor.authorErdmann, Andreas
dc.contributor.authorXu, Dongbo
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorVan de Kruijs, Robbert
dc.contributor.authorEdrisi, Arash
dc.contributor.authorScholze, Frank
dc.contributor.authorLaubis, Christian
dc.contributor.authorIrmscher, Mathias
dc.contributor.authorNaasz, Sandra
dc.contributor.authorReuter, Christian
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-24T10:58:34Z
dc.date.available2021-10-24T10:58:34Z
dc.date.issued2017
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29171
dc.sourceIIOimport
dc.titleReducing EUV mask 3D effects by alternative metal absorbers
dc.typeJournal article
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/1.JMM.16.4.041002
dc.source.peerreviewyes
dc.source.beginpage41002
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue4
dc.source.volume16
imec.availabilityPublished - open access


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