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Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure

dc.contributor.authorPollentier, Ivan
dc.contributor.authorVesters, Yannick
dc.contributor.authorJiang, Jing
dc.contributor.authorVanelderen, Pieter
dc.contributor.authorDe Simone, Danilo
dc.date.accessioned2021-10-24T11:16:13Z
dc.date.available2021-10-24T11:16:13Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29203
dc.sourceIIOimport
dc.titleUnraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.identifier.doi10.1117/12.2281449
dc.source.peerreviewyes
dc.source.beginpage104500H-1
dc.source.endpage104500H-7
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography 2017
dc.source.conferencedate11/09/2017
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10450


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