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Atomic layer deposition of ruthenium thin films from (ethylbenzyl) (1-ethyl-1,4-cyclohexadienyl) Ru: process characteristics, surface chemistry, and film properties

dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorGroven, Benjamin
dc.contributor.authorMarcoen, Kristof
dc.contributor.authorPhung, Quan
dc.contributor.authorDutta, Shibesh
dc.contributor.authorSwerts, Johan
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorVan den Berg, Jaap
dc.contributor.authorFranquet, Alexis
dc.contributor.authorMoussa, Alain
dc.contributor.authorVanstreels, Kris
dc.contributor.authorLagrain, Pieter
dc.contributor.authorBender, Hugo
dc.contributor.authorJurczak, Gosia
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelabie, Annelies
dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2021-10-24T11:17:27Z
dc.date.available2021-10-24T11:17:27Z
dc.date.issued2017
dc.identifier.issn0897-4756
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29205
dc.sourceIIOimport
dc.titleAtomic layer deposition of ruthenium thin films from (ethylbenzyl) (1-ethyl-1,4-cyclohexadienyl) Ru: process characteristics, surface chemistry, and film properties
dc.typeJournal article
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorMarcoen, Kristof
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorLagrain, Pieter
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecLagrain, Pieter::0000-0003-3734-7203
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpage4654
dc.source.endpage4666
dc.source.journalChemistry of Materials
dc.source.issue11
dc.source.volume29
dc.identifier.urlhttp://pubs.acs.org/doi/abs/10.1021/acs.chemmater.6b0543710.1021/acs.chemmater.6b05437
imec.availabilityPublished - imec


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