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Wafer-scale growth of graphene on Ge and Si wafers by reduced-pressure chemical vapor deposition

dc.contributor.authorPorret, Clément
dc.contributor.authorLuraschi, Claudio
dc.contributor.authorNuytten, Thomas
dc.contributor.authorWu, Xiangyu
dc.contributor.authorAsselberghs, Inge
dc.contributor.authorVerguts, Ken
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBrems, Steven
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorLoo, Roger
dc.date.accessioned2021-10-24T11:18:05Z
dc.date.available2021-10-24T11:18:05Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29206
dc.sourceIIOimport
dc.titleWafer-scale growth of graphene on Ge and Si wafers by reduced-pressure chemical vapor deposition
dc.typeMeeting abstract
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorNuytten, Thomas
dc.contributor.imecauthorWu, Xiangyu
dc.contributor.imecauthorAsselberghs, Inge
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorBrems, Steven
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorLoo, Roger
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecNuytten, Thomas::0000-0002-5921-6928
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecBrems, Steven::0000-0002-0282-8528
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.source.peerreviewno
dc.source.beginpageM10.4
dc.source.conferenceE-MRS Fall Meeting, Symposium M
dc.source.conferencedate17/09/2017
dc.source.conferencelocationWarsaw Poland
imec.availabilityPublished - imec
imec.internalnoteshttps://www.european-mrs.com/material-and-device-integration-silicon-advanced-applications-emrs


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