dc.contributor.author | Ritzenthaler, Romain | |
dc.contributor.author | Cho, Moon Ju | |
dc.contributor.author | Schram, Tom | |
dc.contributor.author | Spessot, Alessio | |
dc.contributor.author | Simoen, Eddy | |
dc.contributor.author | O'Sullivan, Barry | |
dc.contributor.author | Dentoni Litta, Eugenio | |
dc.contributor.author | Horiguchi, Naoto | |
dc.contributor.author | Thean, Aaron | |
dc.date.accessioned | 2021-10-24T12:12:49Z | |
dc.date.available | 2021-10-24T12:12:49Z | |
dc.date.issued | 2017 | |
dc.identifier.issn | 1757-2754 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/29302 | |
dc.source | IIOimport | |
dc.title | Treatments for reliability improvement in thick oxides diffusion and gate replacement (D&GR) I/O transistors | |
dc.type | Journal article | |
dc.contributor.imecauthor | Ritzenthaler, Romain | |
dc.contributor.imecauthor | Schram, Tom | |
dc.contributor.imecauthor | Spessot, Alessio | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.imecauthor | O'Sullivan, Barry | |
dc.contributor.imecauthor | Dentoni Litta, Eugenio | |
dc.contributor.imecauthor | Horiguchi, Naoto | |
dc.contributor.imecauthor | Thean, Aaron | |
dc.contributor.orcidimec | Ritzenthaler, Romain::0000-0002-8615-3272 | |
dc.contributor.orcidimec | Schram, Tom::0000-0003-1533-7055 | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.contributor.orcidimec | O'Sullivan, Barry::0000-0002-9036-8241 | |
dc.contributor.orcidimec | Horiguchi, Naoto::0000-0001-5490-0416 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 53 | |
dc.source.endpage | 70 | |
dc.source.journal | International Journal of Materials Engineering Innovation | |
dc.source.issue | 1 | |
dc.source.volume | 8 | |
dc.identifier.url | http://www.inderscienceonline.com/doi/abs/10.1504/IJMATEI.2017.085810 | |
imec.availability | Published - imec | |