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The modeling of electromigration: a new challenge for TCAD?

dc.contributor.authorSchoenmaker, Wim
dc.contributor.authorPetrescu, Violeta
dc.date.accessioned2021-10-01T08:53:00Z
dc.date.available2021-10-01T08:53:00Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2933
dc.sourceIIOimport
dc.titleThe modeling of electromigration: a new challenge for TCAD?
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage328
dc.source.endpage331
dc.source.conferenceSimulation of Semiconductor Processes and Devices 1998 - SISPAD 98
dc.source.conferencedate2/09/1998
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


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