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High volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL

dc.contributor.authorSayan, Safak
dc.contributor.authorVanelderen, Pieter
dc.contributor.authorHetel, Iulian
dc.contributor.authorChan, BT
dc.contributor.authorRaghavan, Praveen
dc.contributor.authorBlanco, Victor
dc.contributor.authorFoubert, Philippe
dc.contributor.authorD'Urzo, Lucia
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-24T13:00:47Z
dc.date.available2021-10-24T13:00:47Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29385
dc.sourceIIOimport
dc.titleHigh volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL
dc.typeProceedings paper
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorHetel, Iulian
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorD'Urzo, Lucia
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage101430U
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2618452
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10143


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