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Reduction of optical bleaching in phosphorus doped Ge layer on Si

dc.contributor.authorSrinivasan, Ashwyn
dc.contributor.authorPorret, Clément
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorShimura, Yosuke
dc.contributor.authorGeiregat, Pieter
dc.contributor.authorLoo, Roger
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorVan Thourhout, Dries
dc.date.accessioned2021-10-24T14:04:41Z
dc.date.available2021-10-24T14:04:41Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29488
dc.sourceIIOimport
dc.titleReduction of optical bleaching in phosphorus doped Ge layer on Si
dc.typeProceedings paper
dc.contributor.imecauthorSrinivasan, Ashwyn
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage53
dc.source.endpage54
dc.source.conferenceIEEE 14th International Conference on Group IV Photonics - GFP
dc.source.conferencedate23/08/2017
dc.source.conferencelocationBerlin Germany
dc.identifier.urlhttp://ieeexplore.ieee.org/document/8082192/
imec.availabilityPublished - open access
imec.internalnotesISBN 978-1-5090-6567-7


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