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Optimization and upscaling of spin coating with organosilane monolayers for low-k pore sealing

dc.contributor.authorSun, Yiting
dc.contributor.authorRomo Negreira, Ainhoa
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorHoflijk, Ilse
dc.contributor.authorVaesen, Inge
dc.contributor.authorConard, Thierry
dc.contributor.authorStruyf, Herbert
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorMoinpour, Mansour
dc.contributor.authorDe Feyter, Steven
dc.contributor.authorArmini, Silvia
dc.date.accessioned2021-10-24T14:28:36Z
dc.date.available2021-10-24T14:28:36Z
dc.date.issued2017
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29526
dc.sourceIIOimport
dc.titleOptimization and upscaling of spin coating with organosilane monolayers for low-k pore sealing
dc.typeJournal article
dc.contributor.imecauthorSun, Yiting
dc.contributor.imecauthorRomo Negreira, Ainhoa
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorHoflijk, Ilse
dc.contributor.imecauthorVaesen, Inge
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorArmini, Silvia
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.source.peerreviewyes
dc.source.beginpage32
dc.source.endpage36
dc.source.journalMicroelectronic Engineering
dc.source.volume137
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0167931716304439
imec.availabilityPublished - imec


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