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Top pinned magnetic tunnel junction stacks with high annealing tolerance for high density STT-MRAM applications

dc.contributor.authorSwerts, Johan
dc.contributor.authorCouet, Sebastien
dc.contributor.authorLiu, Enlong
dc.contributor.authorMertens, Sofie
dc.contributor.authorLin, Tsann
dc.contributor.authorRao, Siddharth
dc.contributor.authorKim, Woojin
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorFurnemont, Arnaud
dc.contributor.authorKar, Gouri Sankar
dc.date.accessioned2021-10-24T14:31:52Z
dc.date.available2021-10-24T14:31:52Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29531
dc.sourceIIOimport
dc.titleTop pinned magnetic tunnel junction stacks with high annealing tolerance for high density STT-MRAM applications
dc.typeMeeting abstract
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorCouet, Sebastien
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorRao, Siddharth
dc.contributor.imecauthorKim, Woojin
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorFurnemont, Arnaud
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecCouet, Sebastien::0000-0001-6436-9593
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecRao, Siddharth::0000-0001-6161-3052
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecFurnemont, Arnaud::0000-0002-6378-1030
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageCF-04
dc.source.conferenceIEEE International Magnetics Conference - INTERMAG
dc.source.conferencedate24/04/2017
dc.source.conferencelocationDublin Ireland
dc.identifier.urlhttp://ieeexplore.ieee.org/document/8007702/
imec.availabilityPublished - open access


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