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Atomic layer deposition of novel interface layers on III-V channel devices

dc.contributor.authorTang, Fu
dc.contributor.authorJiang, Xiaoqiang
dc.contributor.authorXie, Qi
dc.contributor.authorGivens, Michael
dc.contributor.authorMaes, Jan
dc.contributor.authorSioncke, Sonja
dc.contributor.authorTsvetan, Ivanov
dc.contributor.authorNyns, Laura
dc.contributor.authorLin, Dennis
dc.contributor.authorCollaert, Nadine
dc.date.accessioned2021-10-24T14:44:40Z
dc.date.available2021-10-24T14:44:40Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29551
dc.sourceIIOimport
dc.titleAtomic layer deposition of novel interface layers on III-V channel devices
dc.typeProceedings paper
dc.contributor.imecauthorXie, Qi
dc.contributor.imecauthorGivens, Michael
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.source.peerreviewyes
dc.source.beginpageAA2-TuA8
dc.source.conferenceAVS 17th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate15/07/2017
dc.source.conferencelocationDenver, CO USA
imec.availabilityPublished - imec


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